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Sunday, September
6
afternoon:
Arrival of the participants
Monday, September 7
morning:
H. P. Strunk, Erlangen, Germany
Relaxation of misfit-induced
strain in semiconductor heterostructures
E. A. Fitzgerald, Cambridge, USA
Dislocations in relaxed SiGe/Si
heterostructures
V. I. Vdovin, Moscow, Russia
Misfit dislocations in epitaxial
heterostructures: mechanisms of generation and multiplication
B. Pichaud, Marseille, France
Dislocation mechanisms involved
in the relaxation of heteroepitaxial semiconducting systems
J. Katcki, Warsaw, Poland
Formation of dislocations in
InGaAs/GaAs heterostructures
afternoon:
T. Wosinski, Warsaw, Poland
Quantum interference at misfit
dislocations in III-V heterostructures
V. V. Kveder, Chernogolovka, Russia
Electronic properties of regular
dislocations in silicon
S. Mil'shtein, Lowell, USA
Crystalline defects as enhancement
and limits to microminiaturization
evening: Get together at the bonfire
Tuesday, September 8
morning:
R. Hull, Charlottesville, USA
Interactions of moving dislocations
in semiconductors with point, line and planar defects
K. Sumino, Sendai, Japan
Impurity reaction with dislocations
in semiconductors
S. Pizzini, Milan, Italy
Chemistry and physics of segregation
of impurities at extended defects in silicon
M. Seibt, Goettingen, Germany
Structural and electrical properties
of metal silicide precipitates in silicon
evening:
A. George, Nancy, France
Dislocation nucleation and multiplication
at crack tips in silicon
L. I. Fedina, Novosibirsk, Russia
Extended defects formation in
Si crystals at clustering of intrinsic point defects studied by High Resolution
Electron Microscopy
Poster session
A
Wednesday, September 9
morning:
H. Alexander, Cologne, Germany
Kinks on partials of 60-degree
dislocations in silicon as revealed by a new TEM-technique
Yu. L. Iunin & V. I. Nikitenko,
Chernogolovka, Russia
Dislocation kink dynamics in
crystals with deep Peierls potential relief
Y. Yamashita, Okayama, Japan
Hydrogen enhanced dislocation
glides in silicon
V. V. Bulatov, Cambridge, USA
Dislocation mobility in Si: from
atomic core to micron scale
afternoon: Excursion
evening: Conference
dinner
Thursday, September 10
morning:
T. Suski, Warsaw, Poland
Growth and properties of bulk
single crystals of GaN; role of defects
Z. Liliental-Weber, Berkeley, USA
Extended defects in GaN
J.-L. Rouviere, Grenoble, France
Structural characterization of
extended defects in GaN epilayers and AlN/GaN heterostructures by Transmission
Electron Microscopy
afternoon:
G. S. Salviati, Parma, Italy
CL and TEM study of optically
active defects in GaN and AlGaN epilayers grown on sapphire
R. Jones, Exeter, UK
The interaction of oxygen with
dislocations in GaN
evening:
Panel discussion:
The role of dislocations and other extended defects in GaN animated
by E. Weber, Berkeley, USA
Poster session B
Friday, September 11
morning:
H.-J. Moeller, Freiberg, Germany
Oxygen and carbon precipitation
in multicrystalline solar silicon
T. V. Torchinskaya, Kiev, Ukraine
Recombination-enhanced microprecipitate
formation in LPE GaAs structures
H. S. Leipner, Halle, Germany
Positron annihilation at dislocations
and related point defects in semiconductors